John Noh

212-619-6000, ext. 206

•  J.D., Rutgers University School of Law - Newark, 2005
•  B.S. in Chemical Engineering, Columbia University, 2001

•  New Jersey
•  New York
•  Regsitered Patent Attorney, US Patent and Trademark Office

•  Korean

John Noh is an Associate at Fay Kaplun & Marcin with over ten years of experience in all areas of intellectual property law.

Mr. Noh has participated in all stages of U.S. and foreign patent prosecution and litigation involving a wide variety of technologies including networking devices, computer software, wireless devices, glass manufacture, telecommunications networks and equipment and medical devices.

He has amassed significant expertise in the application of a broad range of intellectual property issues to technologies ranging from the physical configurations of wireless devices and in-depth programming details to orthopedic and endoscopic devices as well as optics and the manufacture of glass for flat panel displays.

Mr. Noh has also evaluated patents in a variety of fields to provide non-infringement and invalidity opinions and to aid in the valuation of acquisition targets.

Prior to and during law school, Mr. Noh gained experience as an intern with Hon. Judge Joseph C. Cassini III, J.S.C. and as a law clerk with the New Jersey Attorney General's Office where he observed and participated in various phases of litigation.